Session Track
November 03 (Friday)
마이크로/나노공학부문 포스터
Poster,
3층 로비,
09:50~10:40
- 옥종걸(서울과기대), 장원석(기계연), 강현욱(전남대), 심형철(기계연)
Fr16A-16
09:50~10:40
하이드로젤 쉐도우 마스크를 이용한 금속 박막 압저항 소자 통합 하이드로젤 멤브레인 레조네이터
This paper reports hydrogel mechanical resonators with thin metal film piezoresistors deposited through a hydrogel shadow mask to enable electrical deflection and frequency readouts of resonators. First, circular membrane resonators are simply fabricated by spatially-modulated UV curing of thin polyethyleneglycol diacrylate (PEG-DA) prepolymer on top of polymethylmetacrylate (PMMA) – polydimethylsiloxane (PDMS) composite substrates and dry-state “plugging-out” sacrificial process of the PDMS. Digital micromirror device (DMD)-based dynamic mask lithography is used for spatial modulation of UV light and fabricated hydrogel membrane resonators exhibit diameters of 1 mm and thicknesses of 15 μm. The hydrogel shadow mask is also fabricated with PEG-DA by the dynamic mask lithography. The thickness of the shadow mask is 100 μm and the minimum dimension of the opening is 30 μm. With the hydrogel shadow mask placed over a hydrogel membrane resonator, thin metal (Ti/Au) films, 40 and 80 nm thick, respectively, are deposited by an electron beam evaporator. Then, the deposited thin metal film piezoresistor along with three off-chip resistors makes a Wheatstone bridge that is configured with a differential amplifier. With the constructed readout circuitry, electrical readouts of deflection and frequency of hydrogel membrane resonators are demonstrated and compared with a typical reflection-type optical readout.
Keywords : Hydrogel(하이드로젤), Piezoresistor (압저항 소자), Resonator(공진기), Shadow mask (쉐도우 마스크)
Paper : Fr16A-16.pdf
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