Photovoltaic system has higher thermal efficiency and lower maintenance cost compared to other renewable energy sources. However according to Shockley-Quisser, the limit efficiency of photovoltaic system is about 31%. So to overcome this, thermophotovoltaic system are widely studied. In this system, characteristics of selective absorber/emitter is major factor for efficiency improvement. Photonic crystal, planar type, MDM structrue are proposed as emitter/absorber. However large area process and selective absorbtion/radiation characteristics and heat resistance were problematic at each structure type. In this study, We study about the heat-resistant MDM structure which is etched using Nano-sphere. Tungsten and aluminum oxide are used as materials to ensure the overall thermal stability and we verify the tungsten etching process.