Session Track
November 03 (Friday)
생산 및 설계공학부문 포스터
Poster,
3층 로비,
09:50~10:40
- 김병철(한국기술교육대), 이봉기(전남대), 오유근(홍익대), 김현준(경북대), 이찬우(철도연)
Fr16B-39
09:50~10:40
사파이어 CMP에서의 연마모델에 관한 연구
In this paper, we investigate a CMP model for sapphire CMP by estimating active particles participating material removal process. The developed CMP model was developed based on contact mechanics and tribology. The number of active particle was calculated with the contact area and the number of particles in CMP slurry. This study introduces a new method in calculating the number of active particles in CMP.
Keywords : Chemical mechanical polishing(화학기계적 연마), Sapphire(사파이어), CMP model(CMP모델)
Paper : Fr16B-39.pdf
(사)대한기계학회, 서울시 강남구 테헤란로 7길 22 한국과학기술회관 신관 702호, Tel: (02)501-3646~3648, E-mail: ksme@ksme.or.kr