November 03 (Friday)
M-NEMS/센서 및 측정
Oral,
제1발표장(201A호),
08:40~09:40
  • Chair :
  •  석지원(성균관대)
Fr01A-1
08:40~09:40
초정밀 전자빔 리소그래피 오버레이 기반 3차원 메타물질 구현
김인기, 윤관호, 소순애, 문정호, 김민경, 노준석(포항공과대학교)
Metamaterials, artificially structured materials composed of sub-wavelength unit cells, have enabled the exotic optical properties and extraordinary phenomena such as invisibility cloaking and negative refraction. Current metamaterials are much focused on nanoscale optical metamaterials, working at ultra-violet (UV), visible and near-infrared (NIR) frequencies for practical applications of them. The optical metamaterials demonstration highly relies on nanofabrication. The main challenges in the nanofabrication for the metamaterials are 3D fabrication and large-scale fabrication. Here, we demonstrate ultra-high accurate and precise electron beam ltihography (EBL) overlay process exhibiting sub-20nm alignment errors and over-75% repeatability. Using the EBL overlay process, we fabricate several kinds of 3D optical metamaterials and unconventional 2D hybrid plasmonic nanoantennas.
Keywords : Metamaterials, Plasmonics, Nanofabrication, 3D nanostructures
Paper : Fr01A-1.pdf

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