Entering the 4th industrial revolution era, many companies and research facilities are looking for cheaper and more productive processes and materials to replace and/or innovate diverse products particularly based on the micro- and nanoscale engineering for electronics, photonics, sensors, and bioengineering. For instance, thin metal films patterned in nanoscale are promising for flexible and transparent electronics, plasmonic and photonic devices, and high-performance sensors, but are prone to rely on costly and time-consuming nanofabrication processes typically involving vacuum deposition. In this study, thin silver films were fabricated on either flat rigid substrates or flexible polymers simply by coating the silver oxide ink followed by low-temperature reduction treatment. The film thickness, transmittance, and sheet resistance can be readily tailored by controlling the initial ink concentration and coating speed. This process is much faster, easier, and more scalable than the conventional deposition processes. The fabricated thin silver film can then be patterned to various functional nanoarchitectures such as meshes and gratings, tactfully by soft lithography, roll-to-roll nanoimprinting, and so on.